Tokyo Electron Limited (TEL) announced today that it will begin process development on a CLEAN TRACK™ LITHIUS Pro™ -i/LITHIUS Pro V-i coater/developer that is configured and optimized for advanced double-patterning technology. The tool’s design is based in part on collaborative research done with IBM and its development associates in their Albany Nanotech facility. This first-of-a-kind system will be used to implement double-patterning lithographic schemes in leading-edge, high-volume manufacturing.

Double-patterning technology has been migrating from development to production as ever-shrinking device geometries push the limits of available lithographic tools. Integration schemes such as Litho-Etch-Litho-Etch and Sidewall Image Transfer are examples of double-patterning techniques that have been adopted by leading-edge semiconductor manufacturers for critical device layers. However, the lithographic benefit of double-patterning comes at the expense of higher complexity and cost. As the industry approaches the 22nm generation, there is a strong motivation to develop cost-effective, manufacturable double-patterning schemes that meet the technical requirements of the device.

For the past two years, IBM and TEL have been engaged in double-patterning development at the Albany Nanotech R&D complex in Albany, New York. A CLEAN TRACK LITHIUS Pro -i coater/developer clustered with a state-of-the-art immersion exposure tool was the vehicle for developing unit processes and integration schemes for a Litho-Litho-Etch (LLE) patterning methodology.

The LLE technique features fewer and less complex process sequences compared to traditional double-patterning approaches, and shows potential as a lower-cost advanced patterning solution. Numerous chemistries and process techniques were investigated with the objective of identifying technically-viable, cost-effective processes for device production at the 22nm node and beyond. The learning from this interaction was used by TEL to optimize the chemistries, process modules and tool configuration for the LLE scheme. These refinements are embodied in the in the newly-released CLEAN TRACK LITHIUS Pro -i/LITHIUS Pro V-i manufacturing tool.

“We are very fortunate to have the opportunity to work with IBM in their evaluation of double-patterning processes for future generation devices”, commented Toshi Nishigaki, General Manager of TEL’s CLEAN TRACK Business Unit. “Albany Nanotech provides TEL with a world-class R&D environment that provides us access to the most advanced exposure tools to develop our coater/developer equipment. We believe the expertise gained from this joint evaluation will allow us to rapidly move this critical and enabling process technology from development to production, to the benefit of both our companies.”