Tokyo, November 26, 2010 – Tokyo Electron (TEL) today announced that the company will begin accepting orders in January, 2011 for the Trias™e+ SPAi with a new feature that enables improved plasma controllability.

Aggressive scaling and adoption of new architectures impose stringent requirements on oxidation, nitridation processes to provide improved film properties. The new Trias e+ SPAi addresses those critical film and device requirements.

TEL’s Trias e+ SPAi chamber offers tunability of the plasma for nitridation and oxidation. With its unique plasma generator technology, the Trias e+ SPAi is able to provide inherently excellent oxide film even on high aspect ratio features. It also enables improved control of features employed in 3D structures. The Trias e+ SPAi delivers these technological advantages and also contributes to improved productivity.

This new feature can be upgraded as an option on the existing Trias e+ SPAi, which is the latest evolutionary product in the SPA series. “TEL, an industry leader in the plasma oxidation and nitridation domain, continues to provide innovative solutions in meeting Moore’s law challenges of the industry”, said Tony Kawai, Vice President and General Manager of TEL’s Single Wafer Deposition Business Unit.


*Trias is a trademark of Tokyo Electron Limited in Japan and/or other countries.